Etch Stops
Shown are Single side Polysulfone Vacuum Etch Stop for 4” wafers. This Etch Stop
features double "O" ring seal, vacuum connection. Other sizes are available for
processing 1 ea. 4” to 2 ea. 8” wafers).
Also available are double sided etch stops.
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PROCESS TECHNOLOGY ETCH TECHTM SERIES, CASCADE PROCESS
BATH for KOH process: Non-breakable PFA tank. For use with integral in-tank
heater or external inline heater.
Specifications:
Capacity: Two 4", 5", 6", 8" (100, 125, 150, 200 mm) cassettes, One 8" (200mm) cassette
Temperature range: Up to 180º C dependent on chemistry.
Design:
- Unbreakable PFA inner and outer tanks.
- Inner tank sparger rails provides even chemical dispersion and false bottom on which carriers
are set.
- Inner tank walls have serrated edges to prevent whirlpools.
- The fluoropolymer mid-frame assembly is suspended from the top deck for easy leveling of the
process tank. This ensures uniform cascading of the chemistry.
- Outer PFA weir for enhanced chemical and heat distribution.
- Halar coated stainless steel outer structure for strength and rigidity.
- PTFE top deck assembly for added structural support.
- Air diverter located in the outer weir to prevent the formation of air pockets around the heater.
Standard features:
- Process thermocouple port • Outer weir thermocouple port • Liquid level port for N2 bubble
sensor
- System overflow connection • Drain connection • Process tank leveling adjustments
- Flaretek® inlet connections for remote pump
- Refluxor and cover (not shown)
Heater voltages available: 120 to 600 volts, single or three phase
Options:
- Tank system can be integrated with existing control systems
- PID or PLC Process Controller
- Integral fluoropolymer immersion heater and/or in-line heater (fluoropolymer or quartz available).
- Chemical dispensing manifold
- Custom interfacing to match existing system
- Manual, pneumatic or hydraulic operated lid
- In-line filter chamber
- Custom fitting of tank to match existing system
- Additional ports for level sensing and automatic chemical fill • Wafer locater nest
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Shown Process Technology Etch Tech, not shown
refluxor (condensing head with cover)
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OUR STATIC KOH CONSTANT TEMPERATURE BATHS are available in a wide
variety of configurations. They are engineered to reliably and efficiently heat KOH or
similar chemistries. Operating temperatures range from sub-ambient to 185 degrees
Celsius.
Standard features:
- Teflon immersion heater with integral overtemperature thermocouple.
- J-Type Process thermocouple (if Process Controller is ordered)
- Liquid level sensor (if Process Controller is ordered)
- Teflon process tank
- Refluxor (condensing head) with cooling coils and hinged cover.
- Process Controller with integral timer
Specifications:
Capacity:
- Two ea. 4", 5, 6, 8 (100, 125, 150. 200 mm) cassettes
- One ea. 4", 5, 6, 8 (100, 125, 150. 200 mm) cassette
Options:
- Halar tank
- Custom size (interior dimensions, size and number of cassettes).
- Drain valve or drain adapter (connection)
- Magnetic Stirrer, N2 Bubbler
- Custom Covers (lift off, pass-thrus for etch stop connections), Refluxors
- Voltage, phase.
- Custom Process Controllers with / without timers
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Shown: Static KOH Teflon process bath with Process Controller
refulxor and cover, 1 ea. 6" cassette capacity
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SHOWN DR SERIES QUICK DUMP RINSER, Designed specifically for MEMS
processes. It features a programmable cascade feature and misting spray nozzles to
effectively rinse fragile MEMS devices. MCDR-M Series options include PP or PVDF
construction, Rinse to Resistivity System and N2 bubbler.
Our Quick Dump Rinsers and Cascades are available in a wide variety of configurations.
They are engineered to improve the quality and effectiveness of your rinse process.
Standard features: 2 ea. spray bars, 2 ea. DI water valves, 1 or 2 ea. dump valves (dependent on
size ordered), drop away cover.
Specifications:
Capacity:
- Two ea. 4", 5, 6, 8 (100, 125, 150. 200 mm) cassettes
- One ea. 4", 5, 6, 8 (100, 125, 150. 200 mm) cassette
Material of construction: Polypropylene of PVDF (dependent on model ordered)
Options include:
- Material of construction - Wetted materials include Teflon, PVDF, and polypropylene etc.
- Process applications include cold and hot DI rinse
- Interior dimensions, wafer cassette capacity (size and number of cassettes)
- Single or reclaim double door (applies to Quick Dump Rinsers only)
- Multiple rinse stages / wells (applies to Cascades only)
- N2 Bubbler
- Covers (Hinged - lift off)
- Voltage, phase
- Controller
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Shown: Polypropylene M Series QDR with
QDR Controller, drop down cover, 2 ea. 6"
cassette capacity
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